Research quality
The unit is at the international cutting edge in ALD and innovative in its precursor
design. One notable achievement is that Intel has based its 45 nm MOSFET (metal-
oxide-semiconductor field-effect transistor), in production since 2007, on a material
made by the unit some 14 years ago. New processes have been developed for
ultrahigh-k and ferroelectric oxide films.
Highly effective catalysts have been developed for aerobic oxidation of alcohols,
and frustrated Lewis acid-base pairs are used to activate molecular hydrogen.
Combinatorial methods have been used to aid catalyst design. The level of
innovation in the unit is impressive. Its publication record is very strong, with a
high hit rate in leading journals. The graduated PhD students readily find relevant
employment.
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