Сапаев И. Б. 1,2, Саъдуллаев С. О
-rasm. Birikma yuzasining mikrofotografiyasi. 4-rasm
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Si-CdTe o\'stirish usuli (1) (1)
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- Minnatdorchilik.
3-rasm. Birikma yuzasining mikrofotografiyasi.
4-rasm. Elementlarning birikma yuzasida rentgen-spektroskopiya natijalariga ko‘ra taqsimlanishi. Rentgen-spektroskopiya natijalari 4-rasmda keltirilgan. nSi taglik yuzasida Si miqdori CdTe dan oshadi. Plyonka o‘sishi bilan Si miqdori asta-sekin kamayadi, CdTe esa ortadi. Qatlamlar yuzasidan kadmiy va tellurning ikkilamchi elektron emissiyasi eng yuqori intensivlikka ega ekanligi 4-rasmda ko‘rinadi; ya’ni plyonkalarning sirt qatlami asosan CdTe dan iborat. Ma’lumki, sirt holatlarining past zichligi bilan geterostruktura hosil qilish uchun nomuvofiqlik 7% ichida bo'lishi kerak [17]. Xulosa Vakuumda termik bug‘lanish usulining boshqa metodlardan arzon hamda oddiy ekanligi bilan ajralib turadi. Biz bu usulda Si tagliklarda yuqori sifatli kompozitsion CdTe qatlamlarini ishlab chiqarish mumkinligini ko‘rsatdik. Si-CdTe birikmalarini quyosh elementlari yoki namlik datchiklari sifatida ishlatish mumkin. Birikma olinishining optimal rejimi bosim ≈1,3×10-4 Pa da va temperatura 475 °C da ekani aniqlandi. Minnatdorchilik. Si-CdTe birikmasini olishda yaqinda yordam bergan O‘zFA “Fizika-Texnika” Institutiga o‘z minnatdorchiligimizni bildiramiz. Foydalanilgan adabiyotlar [1] Paul H. Holloway and Gary E. McGuire, “Handbook of Compound Semiconductors: Growth, Processing, Characterization, and Devices”, Noyes Publications, 1995. [2] Li He, Xiangliang Fu, Qingzhu Wei, Weiqiang Wang, Lu Chen, Yan Wu, Xiaoning Hu, Jianrong Yang, Qinyao Zhang, Ruijun Ding, Xiaoshuang Chen, and Wei Lu, “MBE HgCdTe on Alternative Substrates for FPA Applications”, Journal of Electronic Materials 37 (9) 2008. [3] John, E. Ayers, “Heteroepitaxy of Semiconductors: Theory, Growth, and Characterization”, CRC Press Taylor & Francis Group, 2007. [4] M. Niraula, K. Yasuda, T. Ishiguro, Y. Kawauchi, H. Morishita, and Y. Agata, “Metal-Organic Vapor-Phase Epitaxy Growth and Characterization of Thick (100) CdTe layers on (100) GaAs and (100) GaAs/Si Substrates”, Journal of Electronic Materials 32 (7) 2003. [5] O. de Melo, E. Sanchez, H. Rodriguez, S. De Roux, F. Rabago-Bernal, J. Ruiz-Garcia, “Low temperature growth of epitaxial CdSe thin films by an isothermal closed space sublimation technique using two elemental sources”, Materials Chemistry and Physics 59 (1999) 120-124. [6] E.M. Larramendi, E. Puron, L.C. Hernandez, M. Sanchez, S. De Roux, O. de Melo, G. Romero-Paredes, R. Pena-Sierra, M. Tamura, “Atomic layer epitaxy of ZnTe by isothermal closed space sublimation”, Journal of Crystal Growth 223 (2001) 447-449. [7] E.M. Larramendi, E. Puron, and O. de Melo, “CdTe Epitaxial Growth by Isothermal Closed Space Configuration”, phys. stat. sol. 230 (2) 339-342 (2002). [8] S. Tobenas, E.M. Larramendi, E. Puron, O. de Melo, F. Cruz-Gandarilla, M. Hesiquio-Garduno, M. Tamura, “Growth of Cd 9=.g: Zn g Te epitaxial layers by isothermal closed space sublimation”, Journal of Crystal Growth 234 (2002) 311-317. [9] Arev Gabriel Escobedo, “Investigation of CdTe(111) Epitaxial Growth via Close-Space Sublimation”, Masters Thesis, The University of Texas at El Paso, El Paso, TX, USA, 2008. [10] Jose Cruz-Campa, “Modeling of CdTe epitaxial growth by close spaced sublimation”, Masters Thesis, The University of Texas at El Paso, El Paso, TX, USA, 2007. [11] S.N. Almari, “The growth of CdTe thin film by close space sublimation system”, phys. stat.sol. 200 (2) 2003 352-360. [12] R. Bommena, T. Seldrum, L. Samain, R. Sporken, S. Sivananthan, and S.R.J. Brueck, “Strain Reduction in Selectively Grown CdTe by MBE on Nanopatterned Silicon on Insulator (SOI) Substrates’, Journal of Electronic Materials (2008). DOI: 10.1007/s11664-008-0456-x [13] S. Quinones, A. Escobedo, J. McClure, D. Zubia, D. Ferrer, G. Brill, Y. chen, F. Semendy, “Selective CdTe Single Crystal Deposition on CdTe/Si(211) Substrates using Close Spaced Sublimation”, Unpublished, University of Texas at El Paso, Electrical and Computer Engineering Department. [14] R. Zhang and I. Bhat, “Selective Growth of CdTe on Si and GaAs substrates using Metalorganic Vapor Phase Epitaxy”, Journal of Electronic Materials 29(6) 2000. [15] R. Bommena, C. Fulk, Jun Zhao, T.S. Lee, S. Sivananthan, S.R.J. Brueck, and S.D. Hersee, “Cadmium Telluride Growth on Patterned Substrates for Mercury Cadmium Telluride infrared Detectors”, Journal of Electronic Materials 34(6) 2005. [16] T.L. Chu, Shirley S. Chu, C. Ferekides, J. Britt, and C. Q. Wu, “Cadmium telluride films by metalorganic chemical vapor deposition”, J. Appl. Phys. 69 (11), 1 June 1991. [17] Milnes, A.G. and Feucht, D.L., Heterojunctions and Metal–Semiconductor Junctions, New York: Academic, 1972. [18] Il’chuk, G.A., Kusnezh, V.V., Rud’, V.Yu., Rud’, Yu.V., Shapoval, P.I., and Petrus’, R.Yu., Photosensitivity of n-CdS/p-CdTe heterojunctions obtained by chemical surface deposition of CdS, Semiconductors, 2010, vol. 44, no. 3, pp. 318–320. [19] Kognovitskii, S.O., Nashchekin, A.V., Sokolov, R.V., Soshnikov, I.P., and Konnikov, S.G., Fullerene-containing C 60 –CdTe(CdSe) composite nanostructures, Tech. Phys. Lett., 2003, vol. 29, no. 11, pp. 477–479. [20] Nuriyev, I.R., Mekhrabova, M.A., Nazarov, A.M., Sadygov, R.M., and Hasanov, N.G., On the growth, structure, and surface morphology of epitaxial CdTe films, Semiconductors, 2017, vol. 51, no. 1, pp. 34–37. Download 157.75 Kb. Do'stlaringiz bilan baham: |
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