Optoelectronic Semiconductor Devices Principals and Characteristics
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Optoelectronic Semiconductor Devices-Principals an
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- 2.4 SUMMARY ON THE BASIC STRUCTURE OF MODERN ILD, LED AND SLD
Figure 10.: Schematic representation of energy band diagram, refractive index profile, and optical field distribution of double heterostructure LEDs and ILDs. [1] Figure 10. shows the schematic of the DH diode. Difference with the SH diodes: - potential barrier for holes at pN junction and for electrons at the Pp junction; - the index difference between the active layer and surrounding cladding layers also acts as a guide for the resulting optical waves. Because of these improvements, J th can be reduced further to 0.5kA/cm 2 at the room temperature. Further reduction of the threshold current density is possible by using very thin layers which are known as quantum wells (In the thin layer, carrier motion perpendicular to the layer is restricted, and the kinetic energy is quantized into discrete energy levels. Structures consisting of such extremely thin layers having quantized energy levels are called quantum well structures), the thin layer is called potential well, and one of the neighboring layers with wide band-gap energies is called a potential barrier. One of the key results of the potential well is that electrons in solids can behave much like free electrons with plane wave solutions and a parabolic E-k relationship. 2.4 SUMMARY ON THE BASIC STRUCTURE OF MODERN ILD, LED AND SLD All modern ILDs, LEDs and SLDs consist of an active layer and two cladding layers, surrounded by a substrate on one side and a contact layer on the other side. (Figure 11. ). • [1]The active layer is the light generating medium of the diode. It should be a direct band-gap material, with E g corresponding to the desired emission wavelength. The band-gap should be narrower and the refractive index grater than those of the surrounding cladding regions. • [2]The cladding layers restrict the motion of the charge carriers and confine the optical power in the active layer. The band-gap must be wider than band-gap of the active layer in order to prevent the charge carriers from diffusing away from the active layer. Index of refraction must be lower than that of the active layer in order to confine the optical power in the active region. Since no photons are emitted from the cladding layers, materials used can have direct or indirect band-gap. • [3]The substrate provides mechanical support, heat dissipation capability and electrical contact. Proper crystal symmetry and lattice constant of the substrate are necessary for the growth of the succeeding compound semiconductor layers or solid solutions. • [4]The contact layer provides electrical contact. In the case of surface emitting diodes, this layer should also be transparent to the emission wavelength. Download 1.1 Mb. Do'stlaringiz bilan baham: |
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