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Optoelectronic Semiconductor Devices - Principals and Characteristics.
http://www.ece.concordia.ca/~i_statei/vlsi-opt/vlsi-opt02012002.html
Copyright © 1993, 1994, 1995, 1996,
Nikos Drakos
, Computer Based Learning Unit, University of
Leeds.
Copyright © 1997, 1998, 1999,
Ross Moore
, Mathematics Department, Macquarie University, Sydney.
2002-02-17
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Document Outline - Optoelectronic Semiconductor Devices - Principals and Characteristics.
- 1 PREFACE
- 2 ENERGY LEVELS AND BANDS IN SOLIDS
- 2.1 PHOTON EMISSION IN SEMICONDUCTORS: THE CREATION OF LIGHT
- 2.2 SEMICONDUCTOR MATERIALS FOR DIODE LASERS
- 2.2.1 III-V SEMICONDUCTOR
- 2.2.2 II-VI SEMICONDUCTORS
- 2.2.3 IV-VI SEMICONDUCTORS
- 2.3 BASIC SEMICONDUCTOR LUMINESCENT DIODE STRUCTURES
- 2.4 SUMMARY ON THE BASIC STRUCTURE OF MODERN ILD, LED AND SLD
- 3 LASER DIODES
- 3.1 BROAD AREA LASERS
-
- The disadvantage of broad area lasers :
- 3.2 STRIPE GEOMETRY LASERS
- 3.2.1 GAIN-GUIDED STRIPE GEOMETRY LASERS
- 3.2.2 INDEX-GUIDED STRIPE GEOMETRY LASERS
- 3.3 SINGLE-FREQUENCY SINGLE-MODE INJECTION LASERS: FABRY-PEROT LASERS
- 3.4 BASIC CHARACTERISTICS OF LASER DIODES
- 3.4.1 THRESHOLD GAIN AND CURRENT
- 3.4.2 PHASE CONDITION
- 3.4.3 EFFICIENCY AND OUTPUT POWER
- 3.4.4 CURRENT-VOLTAGE CHARACTERISTICS
- 3.5 DIFFERENCES OF ILD FROM GAS, LIQUID DYE AND SOLID STATE LASERS
- 3.6 RECENT DEVELOPMENTS
- 4 LIGHT-EMITTING DIODES
- 4.1 TWO BASIC LED STRUCTURES
- 4.1.1 SURFACE-EMITTING LED
- 4.1.2 EDGE-EMITTING LED
- 4.2 BASIC CHARACTERISTICS OF LED
- 4.2.1 POWER AND LIGHT EXTRACTION EFFICIENCY: SURFACE-EMITTING LED
- 4.2.2 RADIATION INTENSITY PATTERN: SURFACE-EMITTING LED
- 4.2.3 RADIATION INTENSITY PATTERN: EDGE-EMITTING LED
- 4.2.4 CURRENT-LIGHT OUTPUT CHARACTERISTICS
- 4.2.5 CURRENT-VOLTAGE CHARACTERISTICS
- 5 SUPERLUMINESCENT DIODES
- 6 COMPARISON OF ILD, LED AND SLD
-
-
- From a practical point of view:
- 7 PHOTODIODES [4]
- 7.1 BASICS OF PHOTODIODES
- 7.1.1 pn-JUNCTION UNDER REVERSE BIAS AND REVERSE CURRENT
- 7.1.2 OPTICAL ABSORPTION AND QUANTUM EFFICIENCY
- 8 DEVICE FABRICATION
- 8.1 CRYSTAL GROWTH
- 8.1.1 LIQUID-PHASE EPITAXY
- 8.1.2 METAL-ORGANIC VAPOR-PHASE EPITAXY
- 8.1.2.1 Advantages
- 8.1.2.2 Disadvantage
- 8.1.3 MOLECULAR BEAM EPITAXY
- 8.2 DEVICE FABRICATION PROCESSES
- 8.2.1 ELECTRODE FORMATION
- 8.2.2 DIELECTRIC FILM DEPOSITION
- 8.2.3 LITHOGRAPHY AND CHEMICAL AND PHYSICAL ETCHING
- 8.3 PACKAGING
- 9 REFERENCES
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