Optoelectronic Semiconductor Devices Principals and Characteristics


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Optoelectronic Semiconductor Devices-Principals an

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Optoelectronic Semiconductor Devices - Principals and Characteristics. 
http://www.ece.concordia.ca/~i_statei/vlsi-opt/vlsi-opt02012002.html 
Copyright © 1993, 1994, 1995, 1996, 
Nikos Drakos
, Computer Based Learning Unit, University of 
Leeds.
Copyright © 1997, 1998, 1999, 
Ross Moore
, Mathematics Department, Macquarie University, Sydney.
2002-02-17
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Document Outline

  • Optoelectronic Semiconductor Devices - Principals and Characteristics.
    • Contents
  • 1 PREFACE
  • 2 ENERGY LEVELS AND BANDS IN SOLIDS
    • 2.1 PHOTON EMISSION IN SEMICONDUCTORS: THE CREATION OF LIGHT
          • Si
          • Ge
          • GaP
          • InSb
          • InAs
    • 2.2 SEMICONDUCTOR MATERIALS FOR DIODE LASERS
      • 2.2.1 III-V SEMICONDUCTOR
      • 2.2.2 II-VI SEMICONDUCTORS
      • 2.2.3 IV-VI SEMICONDUCTORS
    • 2.3 BASIC SEMICONDUCTOR LUMINESCENT DIODE STRUCTURES
    • 2.4 SUMMARY ON THE BASIC STRUCTURE OF MODERN ILD, LED AND SLD
  • 3 LASER DIODES
    • 3.1 BROAD AREA LASERS
        • The disadvantage of broad area lasers :
    • 3.2 STRIPE GEOMETRY LASERS
    • 3.3 SINGLE-FREQUENCY SINGLE-MODE INJECTION LASERS: FABRY-PEROT LASERS
    • 3.4 BASIC CHARACTERISTICS OF LASER DIODES
    • 3.5 DIFFERENCES OF ILD FROM GAS, LIQUID DYE AND SOLID STATE LASERS
    • 3.6 RECENT DEVELOPMENTS
        • Disadvantages
  • 4 LIGHT-EMITTING DIODES
    • 4.1 TWO BASIC LED STRUCTURES
    • 4.2 BASIC CHARACTERISTICS OF LED
      • 4.2.1 POWER AND LIGHT EXTRACTION EFFICIENCY: SURFACE-EMITTING LED
      • 4.2.2 RADIATION INTENSITY PATTERN: SURFACE-EMITTING LED
      • 4.2.3 RADIATION INTENSITY PATTERN: EDGE-EMITTING LED
      • 4.2.4 CURRENT-LIGHT OUTPUT CHARACTERISTICS
      • 4.2.5 CURRENT-VOLTAGE CHARACTERISTICS
  • 5 SUPERLUMINESCENT DIODES
  • 6 COMPARISON OF ILD, LED AND SLD
        • From a practical point of view:
  • 7 PHOTODIODES [4]
    • 7.1 BASICS OF PHOTODIODES
      • 7.1.1 pn-JUNCTION UNDER REVERSE BIAS AND REVERSE CURRENT
      • 7.1.2 OPTICAL ABSORPTION AND QUANTUM EFFICIENCY
  • 8 DEVICE FABRICATION
    • 8.1 CRYSTAL GROWTH
      • 8.1.1 LIQUID-PHASE EPITAXY
        • 8.1.1.1 Advantages.
      • 8.1.2 METAL-ORGANIC VAPOR-PHASE EPITAXY
        • 8.1.2.1 Advantages
        • 8.1.2.2 Disadvantage
      • 8.1.3 MOLECULAR BEAM EPITAXY
        • 8.1.3.1 Advantages
    • 8.2 DEVICE FABRICATION PROCESSES
      • 8.2.1 ELECTRODE FORMATION
      • 8.2.2 DIELECTRIC FILM DEPOSITION
      • 8.2.3 LITHOGRAPHY AND CHEMICAL AND PHYSICAL ETCHING
    • 8.3 PACKAGING
  • 9 REFERENCES
  • About this document ...

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